Phosphor Doper
To produce the emitter, the wafer is doped with phosphorous by introducing an extremely homogenous mist of phosphorous and water. These phosphorous atoms are subsequently embedded in the surface of the wafer in the diffusion furnace. Thus mobile electrons are produced which serve as charge carriers. A turning station is used for doping the phosphorous on both sides.

Specifications
Inline module for producing the emitter layer on the surface of the solar cell
- No additional handling of cells required
- Micro fine, highly homogeneous phosphoric acid layer
- Uniform distribution of the mist over entire track width
- High process safety through controlled mist generation
- Format-independent, very low set-up time
- Environmental compatibility due to the exclusive use of phosphoric acid (no chloride)