When using photo-active resist it is necessary to expose those structures which are required for the function of the product. This process is carried out in a wet-chemical process.

Inline system for the development of resist structures

• Effective development of resist structures using precisely adjusted and controlled process parameters.
• Consistent processing results are achieved by optimal process guidance and optimal medium distribution on the substrate surface.
• Processing of the glass substrate and foils with a high rate of process safety and system availability.