The variable and gentle transport system of the wafer cleaning process enables a throughput of up to 3,600 wafers per hour in multi-track operation. It is suitable for different wafer formats and handles the wafers carefully without causing damage to the material.

Inline system for horizontal wafer cleaning

• Reduced drag-in/out of chemicals
• A shorter and more constant process guarantees a high reproduction accuracy
• Process control through automatic dosing and bath monitoring
• Continuous circulation of chemistry
• Stain-free drying with dry jets
• Gentle wafer handling without transport damage
• Transport system designed for the handling of different wafer sizes in one line
• Extendable process line
• Complete inline integration of wafer block splitter, horizontal in-line cleaning, metrology inspection and classification